Daniel F. Moore, Ph.D.
Scholar, Scientist, Engineer, Philosopher, Bibliophile, World Traveler, Letter Writer, History Enthusiast, Computer Consultant, Beer Aficionado, and Player of: Trivia, Scrabble, Softball, Monopoly, Rummy Tiles, and Racquetball
Georgia Institute of Technology, Atlanta, GA
Ph.D., Materials Science and Engineering
Thesis: “One-Dimensional Nanostructures of ZnS – Synthesis, Growth, and Theory”
December 2006
University of Chicago, Chicago, IL
A.B., Physics and Mathematics
Research: Quasar absorption line systems with the Sloan Digital Sky Survey
June 2001
- Project manager, MBIR for development applications
- Project manager, Scatterometry for On-Product Focus Control
- Development of metrology tools for lithography applications including CDSEM, CDAFM, and Scatterometry tools
- Developed of techniques and analysis tools for automatic lithography tool control
- Implemented improved statistical sampling and analysis techniques for process development and monitoring
- Taught various classes on statistical analysis including using analyzing scientific data, statistically appropriate experimental design
- Managed planning and organizing for IBM’s Semiconducting Patterning Technical Community of Interest
- Managed communication and planning for IBM’s New Hire Network
- Spearheaded development of GaN-based growth high brightness LEDs
- Managed research and processes in a production environment developing light emitting diodes using MOCVD
- Led programming and scripting team with SAS, Visual Basic, and Excel/Access for analyzing scientific data in a production environment
- Project Manager, Thermal Anneal Tool Qualification
- Led development and implementation into production of new layers to LED structure
- Led and supported 24/7 research, development, and production LED operation
I have worked with several companies on implementing scientifically valid solutions to problems ranging from yield issues and statistical analysis to fundamental materials issues and measurement techniques.
- Expert knowledge of quantitative and analytical skills, particularly with scientific data, including statistical analysis and also data visualization
- Programming and data analysis with SAS, JMP, Matlab, Mathematica, Visual Basic, Excel/Access
- Synthesis and analysis of one-dimensional nanostructures from a variety of materials and thin film Gallium Nitride-based light emitting diodes (LEDs)
- Expert in Metrology and Characterization techniques including: Transmission electron microscopy (TEM) and related techniques (EELS, CBED, HR-TEM, EDS), Scanning electron microscopy (SEM), Scatterometry, X-ray diffraction analysis (XRD), Scanning probe microscopy (SPM, AFM)
- Expert in Materials Growth techniques including: Atomic Layer Deposition (ALD), Metal Organic Chemical Vapor Deposition (MOCVD), Physical Vapor Deposition (PVD) and related techniques
- AAAS Science Policy Fellowship (received)
- Pre-Doctoral Sam Nunn International Security Fellow (2005-06)
Research project culminated in a report on nanotechnology and its potential uses in the military and as a tool for diplomacy in the developing world
- NSF Student and Teacher Enhancement Partnership (STEP) Fellow (2005-06)
- Georgia Institute of Technology Nanoscience and Technology Fellowship (2003-04)
- Molecular Design Institute Fellow (2002-03)
- School of Materials Science and Engineering Advanced Publication Award (2005)
- Director, The Nanoethics Group (2010-Present)
- Advisory Board Member, The Nanoethics Group (2005-2010)
Research focuses on nanotechnology’s integration with the military and the potential impact on international affairs
- AAAS (American Association for the Advancement of Science)
- SPIE
- ASM International
- ACS (American Ceramics Society)
- MRS (Materials Research Society)
- TMS (The Mineral, Metals, and Materials Society)
- The Nanoethics Groups Advisory Board Member
Ongoing research in nanotechnology promises both innovations and risks, potentially and profoundly changing the world. This book helps to promote a balanced understanding of this important emerging technology, offering an informed and impartial look at the technology, its science, and its social impact and ethics. - Nanotechnology is crucial for the next generation of industries, financial markets, research labs, and our everyday lives; this book provides an informed and balanced look at nanotechnology and its social impact
- Offers a comprehensive background discussion on nanotechnology itself, including its history, its science, and its tools, creating a clear understanding of the technology needed to evaluate ethics and social issues
- Authored by a nanoscientist and philosophers, offers an accurate and accessible look at the science while providing an ideal text for ethics and philosophy courses
- Explores the most immediate and urgent areas of social impact of nanotechnology
A full list of publications is available here.
Recent Publications
What Is Nanotechology and Why Does It Matter?: From Science to Ethics, F. Allhoff, P. Lin, Moore, Daniel F., (Oxford: Wiley-Blackwell), in press, March 2010
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings, Alok Vaid, Timothy A. Brunner, Matthew Sendelbach, Daniel Moore, Nelson M. Felix, Cornel Bozdog, Helen Kim, Michael Sendler Stanislav Stepanov, Yoel Cohen, SPIE Advanced Lithography Conference 2010, Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 22-25, 2010
Spatial signature in local overlay measurements: what CDSEM can tell us and optical measurements can not, Scott D. Halle, Daniel Moore, Chas N. Archie, IBM Corp. (United States); Shoji Hotta, Takumichi Sutani, Hitachi America, Ltd. (United States); Akiyuki Sugiyama, Masahiko Ikeno, Hitachi High-Technologies Corp. (Japan); Atsuko Yamaguchi, Kazuyoshi Torii, Hitachi, Ltd. (Japan) , SPIE Advanced Lithography Conference 2010, Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 22-25, 2010
Be all that you can be: The Nano-Enhanced army,Moore, Daniel F., Nano Magazine, Issue 15, Published December 2009.
A full list of presentations is available here.
Some presentations are also available on Slideshare.
Recent Presentations
Why Standard Deviation is Better than Range, Daniel Moore, IBM Education, August 10, 2010 (Slideshare)
Your Sample Size Isn't Large Enough: A Primer on Sample Size, Daniel Moore, IBM Education, August 10, 2010 (Slideshare)
Simultaneous measurement of optical properties and geometry of resist using multiple scatterometry gratings, Alok Vaid, Timothy A. Brunner, Matthew Sendelbach, Daniel Moore, Nelson M. Felix, Cornel Bozdog, Helen Kim, Michael Sendler Stanislav Stepanov, Yoel Cohen, SPIE Advanced Lithography Conference 2010, Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 22-25, 2010
Spatial signature in local overlay measurements: what CDSEM can tell us and optical measurements can not, Scott D. Halle, Daniel Moore, Chas N. Archie, IBM Corp. (United States); Shoji Hotta, Takumichi Sutani, Hitachi America, Ltd. (United States); Akiyuki Sugiyama, Masahiko Ikeno, Hitachi High-Technologies Corp. (Japan); Atsuko Yamaguchi, Kazuyoshi Torii, Hitachi, Ltd. (Japan) , SPIE Advanced Lithography Conference 2010, Metrology, Inspection, and Process Control for Microlithography XXIV, Feb 22-25, 2010
Nanotechnology Human Enhancement and the Military, Moore, Daniel F., Human Enhancement & Nanotechnology Conference, Western Michigan University, March 28-29, 2009 (Slideshare)
For more information, please visit my main page and contact me at dfmoore-at-gmail.com to request a full resume/CV.